MOCVD growth of AlGaInP/GaInP quantum well laser diode with asymmetric cladding structure for high power applications

【摘要】 In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD),we design a new type quantum well LD with an asymmetric cladding structure.The structure is grown by metal organic chemical vapor deposition (MOCVD).For the devices with 100-μm-wide stripe and 1000-μm-long cavity under continuous-wave (CW) operation condition,the typical threshold current is 190 mA,the slope efficiency is 1.31 W/A,the wall-plug efficiency reaches 63%,and the maximum output power reaches higher than 7 W.And the internal absorption value decreases to 1.5 cm-1.更多还原

【Abstract】 In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD),we design a new type quantum well LD with an asymmetric cladding structure.The structure is grown by metal organic chemical vapor deposition (MOCVD).For the devices with 100-μm-wide stripe and 1000-μm-long cavity under continuous-wave (CW) operation condition,the typical threshold current is 190 mA,the slope efficiency is 1.31 W/A,the wall-plug efficiency reaches 63%,and the maximum output power reaches higher than 7 W.And the internal absorption value decreases to 1.5 cm-1.更多还原