【摘要】 利用电子束光刻、X射线光刻和微电镀技术,成功制作了面积为1 mm×1 mm,周期为300 nm,金吸收体厚度为1μm的用于X射线显微成像的透射光栅。首先,利用电子束光刻和微电镀技术在Si3N4薄膜上制作周期为300 nm,厚度为250 nm的高线密度光栅掩模;然后,利用X射线光刻和微电镀技术复制厚度为1μm,占空比接近1∶1,高宽比为7的X射线透射光栅。整个工艺流程充分利用了电子束光刻技术制作高分辨率图形和X射线光刻技术制作大高宽比结构的优点,实现了大高宽比、纳米尺度、侧壁陡直的X射线透射光栅的制作。更多还原

【Abstract】 A transmission grating with an area of 1 mm × 1 mm,a pitch of 300 nm,and a gold thickness of 1 μm for X-ray imaging and microscopy is successfully fabricated by combining electron beam lithography,X-ray lithography,and electroplating.Firstly,a high-density mask in pitch of 300 nm and gold thicknes of 250 nm for transmission grating is originally patterned on the Si3N4 membranes by electron beam lithography and electroplating.Then,the X-ray lithography and electroplating are used to replicate the transmission grating with the profile thickness of 1 μm, aspect ratio of 7,and the duty cycle about 1∶1.Experimental results show that the fabrication method combining electron beam lithography,X-ray lithography and electroplating has advantages over other fabrication methods in big pitch,nanometer scale and straight side well for transmission grating.更多还原