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非制冷红外探测器夹层厚膜工艺及介电性能研究

Interlining thick film process and dielectric property of uncooled infrared detector

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【作者】 范茂彦姜胜林谢甜甜张洋洋张丽芳

【Author】 FAN Mao-yan1,2,JIANG Sheng-lin1,XIE Tian-tian1,ZHANG Yang-yang1,ZHANG Li-fang2(1.Department of Electronic Science and Technology,Huazhong University of Science and Technology,Wuhan 430074,China;2.Yuxi Normal University,Yuxi 653100,China)

【机构】 华中科技大学电子科学与技术系玉溪师范学院

【摘要】 以钡、锶和锰醋酸盐为原料,采用新型溶胶-凝胶法制备锰掺杂4%mol、Ba/Sr分别为60/40、65/35和70/30的纳米粉体,均匀分散于组分相同的BST溶胶中,形成稳定的厚膜先体凝胶。浓度0.4mol/L钛酸钡凝胶薄膜种子层,作为不同组分厚膜之间的中间夹层。利用旋转涂覆工艺在LNO/Pt/Ti/SiO2/Si复合底电极上,制备出厚度约为6~10μm的BST介电增强型夹层厚膜。XRD测试结果表明,650℃热处理2h后的夹层厚膜为单一钙钛矿相,750℃热处理后2h的夹层厚膜在室温、环境温度25℃、频率1kHz下相对介电常数εr和介质损耗tanδ分别约为1200和0.03,室温25℃附近较宽范围介温变化率>1.2%/℃;BST夹层厚膜无裂纹出现,表面平整,致密,是制备大阵列非制冷红外焦平面阵列(UFPA)的优选材料。

【Abstract】 The stable precursor gel of thick film is formed by uniform dispersion of nano-powder into the BST sol.The nano-powder is obtained by a new sol-gel method by means of 4mol% Mn doping,with Ba,Sr and manganese acetate as raw materials.In addition,Ba/Sr ratio is 60/40,65/35 and 70/30,respectively.The BST thin film of with 0.4mol/L concentration is used to be the interlining between the thick films with different components.The BST dielectric-reinforced interlining thick film of around 6-10μm thickness is made in the composite LNO/Pt/Ti/SiO2/Si bottom electrode by spin-coating process.The XRD measurement shows that the interlining thick film by 2h heating treatment at 650℃ is a single perovskite phase.The relative dielectric constant εr and dielectric loss tanδ of the interlining thick film by two-hour heating treatment at 700℃ are approximately 1200 and 0.03 in the case of 25℃ and 1kHz,respectively.The dielectric-temperature change rate is over 1.2%/℃ within a wide range near 25℃.The surface of BST interlining thick film is very smooth and compact without any fracture.Thus,the BST interlining thick film is seen as the preferable material for large UFPA.

【基金】 国家重点基础研究发展计划(973计划)资助项目(2004CB619300);新世纪人才支持计划基金资助项目(NCET-04-0703)
  • 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2009年07期
  • 【分类号】TN215
  • 【被引频次】1
  • 【下载频次】175
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