【摘要】 采用非平衡磁控溅射(UBMS450)法在(100)单晶硅表面制备Si-N-O薄膜。利用X射线光电子能谱(XPS)表征薄膜的成分结构;用血小板粘附试验表征薄膜结构对薄膜血液相容性的影响。研究结果表明,以无机Si为主的Si-N-O薄膜,其血液相容性较差;键合少量O的Si3N4薄膜,其血液相容性较佳。Si-N-O薄膜中N含量和O含量的变化,是导致薄膜结构变化的重要因素。更多还原

【Abstract】 Silicon oxynitride(Si-N-O) films were prepared on the surface of monocrystalline silicon(100) by unbalance magnetron sputtering(UBMS).The chemical composition and structure were characterized by X-ray photoelectron spectrometry(XPS);the influence of films structure on their hemocompatibility was evaluated by platelet adhesion tests.Results indicated that the film structure was influenced significantly by the N content and the O content.The film structure dominated by Si had worse hemocompatibility;the film with Si3N4 bonding O demonstrated better hemocompatibility.更多还原