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Ⅴ/Ⅲ对P型GaP掺杂及红光LED量子效率的影响

The influence of Ⅴ/Ⅲ ratio to doping in P—GaP and Red LED

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【作者】 丁亮李建军康玉柱于晓东邓军韩军沈光地

【Author】 DING liang, LI Jian-jun, KANG Yu-zhu, YU Xiao-dong, DENG Jun, HAN Jun,SHEN Guang-di(College of Electronic Information&Control Engineering,Laboratory of Optoelectronic Technology of Beijing,Beijing University of Technology,Beijing 100022,China)

【机构】 北京工业大学电子信息和控制工程学院,北京市光电子技术实验室

【摘要】 利用低压金属有机物化学气相沉积(LP-MOCVD),对红光发光二极管(LED)的窗口层掺杂进行研究。分别在Ⅴ/Ⅲ比为13、26和52的情况下生长GaP材料,结果发现,Ⅴ/Ⅲ比影响Mg的掺杂浓度和载流子迁移率。在上述Ⅴ/Ⅲ比下生长的GaP,外延生长出红光LED外延片并制备器件,结果发现,生长GaP层时,Ⅴ/Ⅲ比为52的红光LED与Ⅴ/Ⅲ比为13相比,输出光功率提高了23.7%,轴向光强提高了20.4%。

【Abstract】 The doping characteristics in the window layer of red LED have been studied in LP-MOCVD system.GaP material has been grown when V/ⅡI ratios are 13,26 and 52,respectively.The experimental results indicate that V/ⅡI ratio effects carrier concentration and mobility.Finally,red LED with GaP window layer has been fabricated,where GaP has been grown under the above-mentioned V/ⅡI ratios.The result shows that the output power of LED with GaP layer,in which the V/ⅡI is 52,is increased by 23.7% in contrast with LED with GaP layer in which V/ⅡI is 13,while the light intensity increases20.4%.

【基金】 国家自然科学基金资助项目(60506012);北京市科委重点资助项目(D0404003040221);北京市人才强教计划资助项目(05002015200504);北京工业大学第六届研究生科技基金资助项目
  • 【文献出处】 光电子.激光 ,Journal of Optoelectronics.Laser , 编辑部邮箱 ,2009年07期
  • 【分类号】TN312.8
  • 【下载频次】246
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