【摘要】 创建一种光刻胶离心式旋涂过程中基于流体力学分析的凸面胶厚分布及胶厚均匀性模型,根据曲面流体运动方程以及凸面基片的面型特征得到了凸面恒速甩胶过程中胶层厚度的分布公式,结合凸面流体层流条件和牛顿流体的质量连续方程推导出胶厚分布与胶液类型、初始胶液粘度和密度、转速、基片几何尺寸以及甩胶时间等参数的关系式,利用光谱椭偏仪和台阶仪所测得的结果对该模型进行了验证,两者有较好的吻合,同时建立了胶厚均匀性与甩胶转速、甩胶时间的关系式,该模型可跟踪、监控和改进预光刻过程中凸面胶层的均匀性,以便改善最后的光刻线条质量。更多还原

【Abstract】 A model of photoresist-layer(P-L) thickness distribution during curved-surface photoresist-whirl coating in the former proceedings of curved-surface laser direct writing(LDW) is presented based on the hydrodynamics.According to the equation of motion on curved surface and its characteristics,the attenuating equation of photo resist-layer thickness is got during the constant-rate spin coating of convex surface.And the relations between the photo resist thickness distribution on curved-surface substrate and the whirl coating parameters such as the type of photo resist,the initial viscosity and density of photo resist liquid,speed of rotation,geometrical dimensions of substrate,time of spin-coating is established.And these experiment results verified by spectroscopic ellipsometry and profilemeter show that the difference of thickness distribution got by the theoretic model and the actual measured data is very small.Furthermore,the photoresist-layer uniformity on the convex surface substrate relative to speed of rotation and time of spin-coating was got.The model could trace,monitor and modify the uniformity of curved-surface coating thickness to guarantee the preparations for the LDW,and furthermore,improve the quality of curved-surface LDW lines.更多还原