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浸没流多透镜多注电子光学系统的模拟研究

Simulation Study of the Confined-Flow Multi-lenses Multi-beam Electron-Optical System

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【作者】 张瑞王勇谢敬新

【Author】 Zhang Rui①② Wang Yong① Xie Jing-xin① ①(Key Laboratory of High Power Microwave Source and Technologies,Institute of Electronics,Chinese Academy of Sciences,Beijing 100190,China) ②(Graduate University of the Chinese Academy of Sciences,Beijing 100049,China)

【机构】 中国科学院电子学研究所中国科学院高功率微波源与技术重点实验室中国科学院研究生院

【摘要】 该文采用先2维后3维的计算方法,对L波段高峰值功率多注速调管电子光学系统进行了模拟设计。采用均匀场浸没流多透镜聚焦系统对电子注进行聚焦,获得了通过率100%,填充因子55%,特性良好的旁轴电子注。模拟计算表明,多透镜系统可有效调整电子注平衡半径,电子枪区均匀场可有效调整电子注波动性及层流性,聚集系统可在阴极磁感应强度为0.001~0.01T,主磁场为0.06~0.13T的范围内实现对旁轴电子注的良好聚焦。

【Abstract】 The electron-optical system of an L-band multi-beam klystron is designed.The 2-D simulation for the system is conducted first and the 3-D simulation is done in succession.Confined-flow uniform magnetic fields focusing system with multi-lenses is adopted and the paraxial beams with perfect characteristic are obtained.Simulation indicates that the beam occupancy rate is about 55%,the beam transmission rate is 100%,the multi-lenses system can modulate the beam equilibrium radius effectively and the uniform magnetic field in gun region can modulate the beam trajectories.The focusing system allows matching beams with the magnetic fields on the cathode range from 0.001 T to 0.01 T and the magnetic fields in main region range from 0.06 T to 0.13 T.

  • 【文献出处】 电子与信息学报 ,Journal of Electronics & Information Technology , 编辑部邮箱 ,2009年07期
  • 【分类号】TN16
  • 【被引频次】4
  • 【下载频次】73
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