【摘要】 本文介绍了关键尺寸原子力显微镜(CD-AFM)在半导体芯片制造中的应用。通过对比现有的半导体检测仪器与原子力显微镜的工作原理和检测方法,详细探讨了原子力显微镜在目前的半导体芯片45nm节点工艺关键尺寸检测中的优势地位。根据芯片在线关键尺寸检测的具体要求,提出了原子力显微镜急待解决的相关研究内容。更多还原

【Abstract】 In this study,critical dimensions atomic force microscopy(CD-AFM) is introduced in 45 nm node of semiconductor metrology application. We compared the metrology methods used in semiconductor production line and CD-AFM techniques,and draw a conclusion that CD-AFM can provide promising resolutions for 3D metrology in various steps of semiconductor IC fabrication process in 45 nm node. According to online metrology requirements of IC,we bring forward several urgency research problems.更多还原