【摘要】 半导体光刻加工中,平面电机的6个运动自由度之间存在着紧密的电磁和力学耦合,为实现对这6个运动自由度的解耦控制,首先提出了作为执行器的直线电机的电流控制模型,接着提出了执行器力、模式力的概念和基于模式力的解耦动力学模型。基于对样机的运动学和结构参数的合理假设,模式力法可使6个运动自由度的动力学模型之间不再存在耦合,且都为简单的2阶线性系统,可采用多种线性控制器来进行控制。针对样机,推导出了模式力矢量与执行器力矢量的关系矩阵以及平面电机的解耦控制框图,最后以X位置控制为例设计了PD控制器,并对基于模式力的控制方法的可行性进行了探讨。更多还原

【Abstract】 There is tight electromagnetic and mechanical coupling among planar motor (PM) 6-degree of freedom (DOF) motions for photolithography in semiconductor manufacturing. For the purpose of achieving decoupling control of the 6-DOF motions, this paper presents the current-controlled model of linear motor (LM) as the actuators, the concept of the actuator forces and the modal forces, and the decoupling dynamics model based on the modal forces. Under some reasonable assumptions on the prototype motor kinematics and structure parameters, the modal forces method successfully decouples the 6-DOF kinetics models and all the kinetics models become simple 2nd order linear systems which can be controlled with multiform linear controllers. For the prototype motor, the transformation matrices between the modal forces and the actuator forces are derived and the system control block diagram is presented. At last the PD(Proportional-plus-Differential) controller is designed for the purpose of X position control and the feasibility analysis about the modal force method is done.更多还原