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半导体异质结界面处Sb/As交换反应研究
Sb/As Exchange at the Interface of Heterostructures
【摘要】 利用分子束外延(MBE)技术,在GaAs衬底上生长了高质量的GaAs/GaAsSb超晶格,并通过高分辨X射线衍射(HRXRD)技术对Sb/As交换反应进行研究。实验表明,随着衬底温度的升高,Sb解吸附速度增加,在Sb束流作用下形成的GaAs/GaAsSb超晶格中的Sb含量下降。而Sb束流大小和暴露在Sb束流中的时间对GaAs/GaAsSb超晶格中的Sb含量影响很小。这说明Sb与GaAs中的As原子的交换反应仅发生在GaAs表层,Sb原子在GaAs中的扩散距离很短。
【Abstract】 High quality GaAs/GaAsSb superlattices were grown by molecular beam epitaxy (MBE) and the Sb/As exchange action was characterized by high resolution X-ray diffraction (HRXRD). The Sb desorption from the GaAs surface increases with the increase of substrate temperature, causing a net decrease in Sb composition. The Sb flux and the Sb soak time have no obvious effects on the Sb/As exchange. It is shown that the exchange action was restrained on the surface and the Sb diffusion in GaAs was limited.
- 【文献出处】 稀有金属材料与工程 ,Rare Metal Materials and Engineering , 编辑部邮箱 ,2009年11期
- 【分类号】TN304.355
- 【被引频次】2
- 【下载频次】81