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脉冲激光沉积氢化锂薄膜(英文)
Preparation of LiH Thin Films by Pulsed Laser Deposition
【摘要】 用脉冲激光沉积制备了氢化锂薄膜,对薄膜的结构和表面形貌进行了,给出了氢气压和靶基距与沉积速率的关系。运用扫描电镜和X射线衍射仪测试薄膜的性质。测试结果显示,氢气压为10-1mbar时,薄膜表面粗糙且呈现多晶态。对薄膜粗糙度与氢气压的关系进行了讨论。
【Abstract】 We have deposited lithium hydride(LiH)films by pulsed laser deposition,and have investigated structure and surface morphology of the films.The influence of hydrogen-gas pressure and substrate-target distance on the deposition rate have been given.The film properties have been characterized by scanning electron miscroscopy(SEM)and X-ray diffraction(XRD).The scanning electron miscroscopy and X-ray diffraction spectra show surface of films are generally rough and films deposited in the presence of a gas pressure(10-1mbar of H2)are polycrystalline respectively.The origin of this roughness and the pressure of hydrogen on the structural have been discussed.
【Key words】 Pulsed laser deposition; LiH film; Structural properties; Surface morphology;
- 【文献出处】 材料工程 ,Journal of Materials Engineering , 编辑部邮箱 ,2009年S2期
- 【分类号】TB383.2
- 【下载频次】79