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退火温度对Sol-gel法制备的BiFeO3薄膜结构及电性能的影响

Influence of Annealing Temperature on Structure and Ferroelectric Properties of BiFeO3 Thin Films Prepared by Sol-gel Process

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【作者】 王秀章晏伯武刘红日

【Author】 WANG Xiuzhang1,YAN Bowu2,LIU Hongri1(1 School of Physics and Electronic Science,Hubei Normal University,Huangshi 435002;2 School of Computer Science,Huangshi Institue of Technology,Huangshi 435003)

【机构】 湖北师范学院物理与电子科学学院黄石理工学院计算机学院

【摘要】 采用溶胶-凝胶法在ITO/glass衬底上制备了BiFeO3薄膜,退火温度分别为500℃和550℃。实验结果表明,550℃退火的薄膜晶粒较大且不均匀,并有杂相产生,薄膜的漏电流较大,没有得到饱和的电滞回线;而在500℃退火的薄膜晶粒较小且均匀,没有杂相产生,相对于550℃退火的薄膜,其漏电流密度降低了约2个数量级,铁电性得到明显增强,剩余极化强度约为40μC/cm2,矫顽场约为75kV/cm,最大的测试电场为130kV/cm。

【Abstract】 The sol-gel process is adopted to prepare BiFeO3 films on ITO/glass substrates annealed at 500℃ and 550℃.The experiment results show that the film annealed at 550℃ has larger,more asymmetric grains and impurity phase.In addition,the unsaturated ferroelectric hysteresis loop is obtained and the leakage current of the film is larger when the one annealed at 550℃,while smaller grains with no impurity phase are observed in the film annealed at 500℃.More intensely ferroelectric property is gained,and the leakage current of the films is reduced for nearly two orders of magnitude than that of the film annealed at 500℃.The ferroelectric properties get enhanced,and the remnant polarization and coercive field are observed to be 40μC/cm2 and 75kV/cm under 130kV/cm.

【基金】 国家自然科学基金资助项目(10874075);湖北省教育厅重点科技项目基金资助项目(D20082203);黄石市科技攻关计划项目基金资助项目(黄科技发成[2006]18号)
  • 【分类号】TM27
  • 【被引频次】9
  • 【下载频次】361
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