【摘要】 铀薄膜有助于原子参数的测试研究,目前对铀薄膜研究的报道较少。利用超高真空磁控溅射法在单晶Si片上制备了铀薄膜。通过扫描电子显微镜(SEM)对铀薄膜的表面形貌进行了观察,利用X射线光电子能谱仪(XPS)及X射线衍射仪(XRD)对铀薄膜的表面结构及元素状态进行了分析和表征。结果表明:铀薄膜呈片状式生长,比较致密、连续,表面由铀及氧化铀组成,之下为纯铀。更多还原

【Abstract】 Uranium film was prepared on the surface of single crystal silicon wafer by using ul-tra high vacuum magnetron sputtering.The surface morphology of the resulting uranium film was observed using a scanning electron microscope.The surface chemical state and phase structure of the film were analyzed by means of X-ray photoelectron spectroscopy and X-ray diffraction.Results show that the as-prepared uranium film is flake-like,compact and continuous.The surface of the film is composed of elemental U and uranium oxide,while the bulk film is composed of elemental U alone.更多还原