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掺杂VO2薄膜的制备及其光电性质
Preparation of Doped VO2 Thin Films and Its Electrical-Optical Properties
【摘要】 以石英片为基底,采用直流/射频磁控共溅射法制备了掺Al、掺Ti的VO2薄膜。对所制样品进行了电阻-温度关系、原子力显微镜、透射光谱等光电性能测试。结果分析表明,Al元素可以提高薄膜相变温度及Ti元素可以有效提高相变前后电阻率变化幅度,并且用半导体能带理论对VO2薄膜光电性质改变的原因及掺杂对其造成的影响予以解释,提出了影响相变滞豫的原因及改善方法。最后对磁控共溅射沉积方法制备掺杂薄膜的工艺方法提出了改进。
【Abstract】 Al-and Ti-doped VO2 films were deposited on quartz substrates using DC/RF magnetron co-sputtering techniques.The resistance-temperature dependence and transmittance spectroscopy properties were tested by AFM.The experimental results indicate that the thermal-optical and electric properties of Al-doped and Ti-doped VO2 films can be changed dramatically after the phase transition.It was explained by the energy band theory,and a method was proposed to improve the magnetron co-sputtering techniques.
【关键词】 二氧化钒薄膜;
磁控共溅射;
掺杂;
光电特性;
能带;
【Key words】 VO2 film; magnetron co-sputtering; doping; electrical-optical properties; energy band;
【Key words】 VO2 film; magnetron co-sputtering; doping; electrical-optical properties; energy band;
- 【文献出处】 半导体技术 ,Semiconductor Technology , 编辑部邮箱 ,2009年02期
- 【分类号】O484
- 【被引频次】6
- 【下载频次】344