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衬底温度和氧分压对ZAO薄膜结构及光学性能的影响
Effect of Substrate Temperature and Oxygen Partial Pressure to ZAO Thin Films Structure and Optical Properties
【摘要】 采用直流磁控溅射技术,以氧化锌铝陶瓷靶为靶材,在玻璃衬底上制备了ZnO:Al(ZAO)薄膜,研究了不同工艺参数对薄膜晶体结构及光学性质的影响。实验结果表明:ZAO薄膜具有六角纤锌矿结构且呈c轴择优取向,晶粒垂直于衬底方向柱状生长,衬底温度和氧分压对薄膜的结构和光学性能有重大影响。在衬底温度为200℃、氧氩分压比为1%时,薄膜结晶性能最好,平均透射率可达86.5%。
【Abstract】 Using ZnO mixed with Al2O3(3wt%) as target,ZAO thin films were deposited on glass substrate by DC magnetron sputtering,the influences of the deposition parameters on the crystallization behavior as well as optical properties of ZAO films have been investigated.The X-ray diffraction measurements revealed that ZAO film was polycrystalline with the hexagonal crystal structure and has a strongly preferred orientation of c axis perpendicular to the substrate surface.The structure and optical transmittance of ZAO films were obviously influenced by the substrate temperature and oxygen partial pressure.The obtained film exhibits optimal structure and optical transmittance of 86.5% with the substrate at 200℃ and the oxygen and argon ratio was 1%.
【Key words】 ZAO films; substrate temperature; oxygen partial pressure; optical transmittance;
- 【文献出处】 湖南工业大学学报 ,Journal of Hunan University of Technology , 编辑部邮箱 ,2008年04期
- 【分类号】O484.41
- 【被引频次】3
- 【下载频次】123