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关于真空激光减薄薄膜技术的研究
Laser Thinning and Trimming of Films in Vacuum
【摘要】 本文提出了一种新颖的可精确、快速、清洁的减薄薄膜的技术——真空激光减薄技术。即指利用激光器发出的脉冲激光束聚焦成直径很小的光斑,调节到适当的能量密度,对真空环境中的薄膜层进行高速扫描,从而减薄膜层。实验中,将此种技术对石英晶片表面膜层进行减薄。根据石英晶振谐振频率与其表面膜层厚度之间的反比关系,来间接测量激光对于石英晶振的膜厚减薄量。实验证实了真空激光减薄方法的可行性。膜层减薄厚度最小可达15.9,对应频率改变量为12Hz,亦即频率改变量可达2ppm以下。减薄速率可达到每秒1~2个石英晶振片。
【Abstract】 A novel technique has been successful developed to thin and trim films with laser ablation in vacuum.In the technique,the energy density of the pulsed laser beam is first carefully adjusted,and then the focused laser beam scans along the surface of the films to be thinned or trimmed;and the variations in the film thickness can be monitored with a quartz sensor.In our thinning of quartz slices,the preliminary results show that its minimum thinning can be as low as 1.59 nm and two slices can be thinned in just one second.Its many advantages include easy operation,high precision,high speed,clean environment and low contamination.
【Key words】 Laser; Thinning technology; Thin film; Quartz crystal resonator;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2008年S1期
- 【分类号】TN249
- 【被引频次】4
- 【下载频次】166