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非平衡磁控溅射沉积TiN/Ti-O复合薄膜机械性能研究

Mechanical Properties of TiN/Ti-O Composite Films Grown by Unbalanced Magnetron Sputtering

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【作者】 何婵齐峰冷永祥黄楠

【Author】 He Chan1,Qi Feng1,Leng Yongxiang1,2,Huang Nan1,2(1.School of Materials Science & Engineering,Southwest Jiaotong University,Chengdu 610031,China;2.Key Lab.for Advanced Technologies of Materials of Ministry of Education,Southwest Jiaotong University,Chengdu 610031,China)

【机构】 西南交通大学材料科学与工程学院西南交通大学材料科学与工程学院 成都610031成都610031成都610031西南交通大学材料先进技术教育部重点实验室成都610031

【摘要】 本文利用非平衡磁控溅射设备,采用四种不同的TiN到Ti-O的过渡方式,在Si(100)和Ti6Al4V基体上制备了TiN/Ti-O薄膜。采用X射线衍射(XRD)分析薄膜的结构;使用AMBIOSXP-2台阶仪检测薄膜应力;利用HXD1000Bknoop型显微硬度仪、瑞士CSEM销盘摩擦磨损实验机、WS—97系统划痕实验机对薄膜的力学性能进行检测。结果表明,在钛合金表面制备TiN薄膜后,逐渐降低N2流量至0sccm,沉积一层Ti膜,再用逐渐通入O2制备Ti-O薄膜的工艺制备的TiN/Ti-N/Ti/Ti-O薄膜具有较好的力学性能。

【Abstract】 The TiN/Ti-O composite films were deposited by unbalanced magnetron sputtering on silicon(100)and titanium alloy(Ti6Al4V)substrates.The microstructures and mechanical properties of the films were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM)and conventional mechanical probes.The results show that the film growth conditions strongly affect the mechanical properties of the Ti-O layers on top of the TiN-covered Ti substrates.For example,the TiN/Ti-O composite films display excellent mechanical properties,when the Ti monolayer was first grown on TiN films under the conditions that the nitrogen flow rate slowly decreased to 0 sccm and oxygen gradually filled in,and then Ti-O film formed.Possible mechanisms were also discussed.

【基金】 国家自然科学基金重点项目(No.50535050);四川省科技攻关项目(No.2006J02-006-4);表面物理与化学国家重点实验室基金资助(No.90000460200605)
  • 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2008年S1期
  • 【分类号】TB383.2
  • 【被引频次】3
  • 【下载频次】218
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