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非平衡磁控溅射沉积TiN/Ti-O复合薄膜机械性能研究
Mechanical Properties of TiN/Ti-O Composite Films Grown by Unbalanced Magnetron Sputtering
【摘要】 本文利用非平衡磁控溅射设备,采用四种不同的TiN到Ti-O的过渡方式,在Si(100)和Ti6Al4V基体上制备了TiN/Ti-O薄膜。采用X射线衍射(XRD)分析薄膜的结构;使用AMBIOSXP-2台阶仪检测薄膜应力;利用HXD1000Bknoop型显微硬度仪、瑞士CSEM销盘摩擦磨损实验机、WS—97系统划痕实验机对薄膜的力学性能进行检测。结果表明,在钛合金表面制备TiN薄膜后,逐渐降低N2流量至0sccm,沉积一层Ti膜,再用逐渐通入O2制备Ti-O薄膜的工艺制备的TiN/Ti-N/Ti/Ti-O薄膜具有较好的力学性能。
【Abstract】 The TiN/Ti-O composite films were deposited by unbalanced magnetron sputtering on silicon(100)and titanium alloy(Ti6Al4V)substrates.The microstructures and mechanical properties of the films were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM)and conventional mechanical probes.The results show that the film growth conditions strongly affect the mechanical properties of the Ti-O layers on top of the TiN-covered Ti substrates.For example,the TiN/Ti-O composite films display excellent mechanical properties,when the Ti monolayer was first grown on TiN films under the conditions that the nitrogen flow rate slowly decreased to 0 sccm and oxygen gradually filled in,and then Ti-O film formed.Possible mechanisms were also discussed.
【Key words】 TiN/Ti-O complex film; Unbalanced magnetron sputtering; Wear resistance; Adhesion;
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2008年S1期
- 【分类号】TB383.2
- 【被引频次】3
- 【下载频次】218