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交叉型天线感应耦合等离子体源放电特性及均匀性
Discharge Characteristics and Uniformity of Inductively Coupled Plasma Source with Crossing Antenna
【摘要】 本文介绍了一种交叉型天线射频感应耦合等离子体源,射频天线穿过交叉排列的石英管内置于真空腔体中。本文运用朗谬尔探针方法诊断了放电等离子体的参量及其均匀性,运用发射光谱技术进行了Ar谱线[4s’(1/2)0-4p’(1/2)]的发光强度的表征,并使用自制的Rogowski线圈测量了天线中的射频电流变化。结果表明,等离子体放电随着射频输入功率的增加存在着E模式向H模式的转变,H模式放电时发光强度及射频电流明显增大。电子温度随气压的增大而降低,几乎不受功率的影响。该等离子体源所产生的等离子体密度较高,等离子体均匀性在中心±60 mm区域内优于90%。
【Abstract】 A novel type of inductively coupled plasma(ICPs) source with a crossing antenna was successfully developed.The RF antenna were embedded in a quartz tube and installed in a vacuum chamber.Its characteristics and the uniformity of the plasma were studied with a Langmuir probe and other conventional probes.The results show that high density plasma with the uniformity higher than 90%,around the central ±60mm area,can be generated,and that the RF power significantly affects the characteristics of the plasma.For example,as the RF power increases,the E-mode of the plasma transits into H-mode;its photoemission intensity and RF current drastically increase.The electron temperature drops with an increase of the pressure but is little affected by the RF power.
【Key words】 Inductively coupled plasma; Antenna; Langmuir probe; Optical emission spectroscopy(OES);
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2008年02期
- 【分类号】O539
- 【下载频次】150