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交叉型天线感应耦合等离子体源放电特性及均匀性

Discharge Characteristics and Uniformity of Inductively Coupled Plasma Source with Crossing Antenna

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【作者】 卢春山辛煜孙刚孙恺

【Author】 Lu Chunshan,Xin yu,Sun Gang,Sun Kai(Provincial Key Lab of Thin Films,School of Physical Science and Technology,Suzhou University,Suzhou 215006,China)

【机构】 苏州大学物理科学与技术学院薄膜材料江苏省重点实验室苏州大学物理科学与技术学院薄膜材料江苏省重点实验室 苏州215006苏州215006

【摘要】 本文介绍了一种交叉型天线射频感应耦合等离子体源,射频天线穿过交叉排列的石英管内置于真空腔体中。本文运用朗谬尔探针方法诊断了放电等离子体的参量及其均匀性,运用发射光谱技术进行了Ar谱线[4s’(1/2)0-4p’(1/2)]的发光强度的表征,并使用自制的Rogowski线圈测量了天线中的射频电流变化。结果表明,等离子体放电随着射频输入功率的增加存在着E模式向H模式的转变,H模式放电时发光强度及射频电流明显增大。电子温度随气压的增大而降低,几乎不受功率的影响。该等离子体源所产生的等离子体密度较高,等离子体均匀性在中心±60 mm区域内优于90%。

【Abstract】 A novel type of inductively coupled plasma(ICPs) source with a crossing antenna was successfully developed.The RF antenna were embedded in a quartz tube and installed in a vacuum chamber.Its characteristics and the uniformity of the plasma were studied with a Langmuir probe and other conventional probes.The results show that high density plasma with the uniformity higher than 90%,around the central ±60mm area,can be generated,and that the RF power significantly affects the characteristics of the plasma.For example,as the RF power increases,the E-mode of the plasma transits into H-mode;its photoemission intensity and RF current drastically increase.The electron temperature drops with an increase of the pressure but is little affected by the RF power.

【基金】 国家自然科学基金资助(No.10305008)
  • 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2008年02期
  • 【分类号】O539
  • 【下载频次】150
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