【摘要】 利用溶胶凝胶方法在石英玻璃衬底上制备了ZnO:Mg薄膜,将能量56 keV、剂量1×1017ions/cm2的N离子注入到薄膜中.离子注入后,将样品在500-900℃的氮气中退火,利用X射线衍射(XRD)和光吸收研究了薄膜中缺陷的恢复过程.结果显示,离子注入层在600-900℃的退火过程中分解和蒸发现象明显,这个结果对利用离子注入技术制备p型ZnO有很重要的意义.更多还原

【Abstract】 ZnO:Mg films were deposited on fused silica glass by sol-gel process.N ions of 56 keV to a fluence of 1×1017 ions/cm2 were implanted into ZnO:Mg films.The implanted films were annealed in nitrogen at 500-900 ℃.XRD and optical absorption were used to investigate the structural recovery of N implanted ZnO:Mg films.Results showed that thermal evaporation and decomposition existed during thermal annealing at 600-900 ℃.Our observation is important for fabrication of p-ZnO by ion implantation.更多还原