【摘要】 采用NaBH4还原法制备了钴纳米粒,将其固定于氧化铟锡(ITO)电极上,首次制成了纳米钴修饰电极(NpCo/ITO),并研究了阿霉素(adriamycin,ADM)在NpCo/ITO上的电化学性质。用循环伏安法(CV)、扫描电子显微镜(SEM)和能量色散谱(EDS)等对纳米钴修饰电极表面进行了表征。在纳米钴修饰电极上,阿霉素(ADM)在0.01 mol.L-1KH2PO4-K2HPO4溶液(pH8.0)中,出现还原峰,峰电位为-0.67 V(vsAg/AgCl),峰电流与ADM浓度在1.0×10-8~2.0×10-6mol.L-1呈线性关系,检测限为5.0×10-9mol.L-1。循环伏安法研究表明,该体系属于具有吸附性的不可逆过程,NpCo/ITO对ADM的电化学还原过程产生较大的促进作用。更多还原

【Abstract】 A cobalt nanoparticles modified ITO electrode（NpCo/ITO） was prepared by casting cobalt nanoparticles onto ITO electrode and the cobalt nanoparticles were synthesized by NaHB₄ reduction.The electrochemical behaviors of adriamycin（ADM） on NpCo/ITO were studied.The modified ITO electrode was characterized by cyclic voltammetry（CV）,scanning electron microscopy（SEM） and energy dispersive spectroscopy（EDS）.In a 0.01 mol·L^-1 PBS（pH 8.0） buffer solution,a sensitive reduction peak of ADM was obtained.A linear relationship is held between the peak current and ADM concentration in the range of 1.0×10^-8-2.0×10^-6 mol·L^-1 with detection of 5.0×10^-9 mol·L^-1 by cyclic voltammetry（CV） response.The reduction process was irreversible with adsorption at the NpCo/ITO electrode.The modified electrode showed an excellent electrocatalytic activity for the ADM electrochemical reduction.更多还原