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Fabrication and photoluminescence characteristics of nonuniform Yb-Er codoped films

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【作者】 李成仁雷明凯李淑凤刘玉凤宋昌烈

【Author】 LI Chengren1, 2, 3, LEI Mingkai 1, LI Shufeng3, LIU Yufeng2, SONG Changlie3 (1. School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China; 2. College of Physics and Electronic Technology, Liaoning Normal University, Dalian 116029, China; 3. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China)

【机构】 School of Materials Science and Engineering Dalian University of TechnologySchool of Materials Science and EngineeringDalian University of TechnologySchool of Physics and Optoelectronic TechnologyCollege of Physics and Electronic TechnologyLiaoning Normal UniversityDalian 116024 China College of Physics and Electronic Technology Liaoning Normal University Dalian 116029 China School of Physics and Optoelectronic Technology Dalian University of Technology Dalian 116024 ChinaDalian 116024 ChinaDalian 116024 ChinaDalian 116029 China

【摘要】 The nonuniform Yb-Er Codoped Al2O3 films were prepared on SiO2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. Some curves of Photoluminescence (PL) peak intensity were obtained by adjusting the deposition parameters, such as, the pillar number of erbium and ytterbium in the mixed target and the distance between a sample table and targets. Typically, the curve of PL peak intensity against the offset distance was approximately linear. The ratio of the PL intensity at the two ends of the same sample was 12.6 and the slope was 71.83/mm when the pillar numbers of the erbium and ytterbium in the mixed target are 5 and 60, respectively, and the distance between targets and the sample table is 2.9 cm.

【Abstract】 The nonuniform Yb-Er Codoped Al2O3 films were prepared on SiO2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. Some curves of Photoluminescence (PL) peak intensity were obtained by adjusting the deposition parameters, such as, the pillar number of erbium and ytterbium in the mixed target and the distance between a sample table and targets. Typically, the curve of PL peak intensity against the offset distance was approximately linear. The ratio of the PL intensity at the two ends of the same sample was 12.6 and the slope was 71.83/mm when the pillar numbers of the erbium and ytterbium in the mixed target are 5 and 60, respectively, and the distance between targets and the sample table is 2.9 cm.

【基金】 Project supported by the National Natural Science Foundation of China (60477023);the Natural Science Foundation of Science and Tech-nology Commission of Liaoning Province (20062137)
  • 【文献出处】 Journal of Rare Earths ,稀土学报(英文版) , 编辑部邮箱 ,2008年01期
  • 【分类号】TB383.2
  • 【被引频次】1
  • 【下载频次】55
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