【摘要】 介绍了无掩模光刻技术的现状和存在的问题,并对几种常见的无掩模光刻技术进行了详细的对比分析。研究表明,扫描电子束光刻具有极高的分辨率,但是生产效率较低;波带片阵列光刻技术已经在理论和实验上取得了广泛的成果,在保持无掩模光刻技术高分辨力的同时,对电子束的低效率将是一种补充,是一种很有潜力的用于制作掩模版的光刻技术。更多还原

【Abstract】 As a promising technology,it has significant advantages for low-volume manufacturing,high resolution required,research,design verification and the exploration of novel applications of lithography.The present and the problem of the maskless lithography wereintroduced.By comparing several familiar maskless lithography technologies,some results were acquired.Scanning electron-beam lithography (SEBL) systems have high resolution but low-volume manufacturing.Zone-plate-array lithography (ZPAL) has produced extensive theoretic and experi mental results,it will be usedin making masktool for its’highresolution and as a complement to SEBL.更多还原