【摘要】 在化学机械抛光(CMP)中,为了提高氧化铝磨料的分散稳定性及减少抛光划痕,通过硅烷偶联剂在其表面接枝了聚甲基丙烯酸(PMAA)制得了一种新型的复合粒子(-αAl2O3-g-PMAA)。SEM结果表明,制得的复合粒子分散稳定性明显提高。进而用SPEEDFAM-16B-4M抛光机研究了其在玻璃基片中的抛光性能。抛光后玻璃基片表面的ZYGO表面形貌仪和AFM分析结果表明,在相同的抛光条件下,与纯Al2O3磨料相比,所制得的复合粒子表现出了低的表面粗糙度及划痕。该复合粒子可望用做新型CMP磨粒。更多还原

【Abstract】 In order to enhance the dispersion stability of alumina abrasives and prevent agglomerations in chemical mechanical polishing(CMP) slurry.α-alumina-g-polymethacrylic acid composite abrasives(α-Al2O3-g-PMAA) was prepared by grafting polymerization.Scanning electron microscope(SEM) analysis indicates that the prepared α-Al2O3-g-PMAA abrasives have better dispersion stability than pure α-Al2O3 abrasives.Further the CMP performances of the α-Al2O3-g-PMAA composite abrasives on glass substrate were investigated by SPEEDFAM-16B-4M CMP equipment.Atomic force microscope(AFM) images showe that the root mean square(RMS) of the polished glass substrate can be decreased from 67.058 nm to 1.703 nm and 1.331 nm for pure alumina abrasives and the composite abrasives,respectively.更多还原