【摘要】 以尿素[CO(NH2)2]、(NH4)2Ce(NO3)6和SiO2为原料,采用均相沉淀法制备1种新型纳米SiO2/CeO2复合磨粒,通过X射线衍射仪、X射线光电子能谱仪、飞行时间二次离子质谱仪和扫描电子显微镜等分析手段对其结构进行表征,并将SiO2/CeO2复合磨粒配置成抛光液在数字光盘玻璃基片上进行化学机械抛光试验.结果表明:所制备的SiO2/CeO2复合磨粒的平均晶粒度为19.64 nm,粒度分布均匀;经过1 h抛光后,玻璃基片的平均表面粗糙度(Ra)由1.644 nm降至0.971 nm;抛光后玻璃基片表面变得光滑、平坦,表面微观起伏较小.更多还原

【Abstract】 A kind of novel nano SiO2/CeO2 composite particles were synthesized using CO(NH2)2、(NH4)2Ce(NO3)6 and SiO2 by homogenous precipitation,and they were characterized by XRD,XPS,TOF-SIMS and SEM.The average diameter of particles was 19.64 nm,and particle size distributed uniformly.The polishing performance of the SiO2/CeO2 composite abrasives on glass substrate were investigated using SPEEDFAM-16B-4M CMP equipment.The average roughness Ra of the surface was reduced from 1.644 nm to 0.971 nm after one hour polishing.AFM showed that the polished glass substrate surface became smooth and micro-defects could hardly be observed.更多还原