【摘要】 RF磁控溅射是目前应用最广泛的一种溅射沉积方法。由于陶瓷溅射的现象相当复杂,目前尚无完整的溅射理论可以用来分析溅射现象,所以通常通过实验来确定溅射过程中的影响因素。综述了RF磁控溅射陶瓷薄膜过程中的影响因素,阐述了微波介质陶瓷薄膜的应用前景,并指出了今后的发展方向。更多还原

【Abstract】 RF magnetron sputtering is a method of sputtering deposition which is widely used presently.Due to the fairly complicated phenomenon of ceramic sputtering,there isn’t a complete sputtering theory to analyze it.So the factors in the course of the sputtering are usually determined by the tests.How the factors influence dielectric properties of thin films in the course of magnetron sputtering microwave dielectric ceramic thin films is generally indicated,and illustrated the application prospective of microwave dielectric ceramic thin films and the direction of the future development.更多还原