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Ni/Al纳米多层膜的界面扩散与电阻率
INTERFACE DIFFUSION AND RESISTIVITY OF Ni/Al NANOMULTILAYERS
【摘要】 采用FS-MS模型研究了Ni/Al纳米多层膜的薄膜电阻率ρ及镜面反射系数P随周期数n、Ni/Al调制比R和调制波长L的演变规律,从而表征了多层膜界面扩散行为的尺度依赖性.结果表明:随着n减小,ρ基本恒定,多层膜界面扩散行为对调制周期数不敏感;而随着薄膜特征尺度R和L的减小,出现ρ异常增加和P明显减小的变化过程.P对薄膜特征尺度的依赖关系反映了多层膜界面扩散行为的尺寸效应,即多层膜界面非对称的互扩散行为只在低调制比与低调制波长尺度下加剧,此时界面互促效应凸现;在高于临界调制波长和调制比的情况下,互促效应弱化,薄膜界面扩散行为不明显.
【Abstract】 In order to clarify the scale-dependent interface diffusion behavior,the resistivity (ρ) and the specular reflection coefficient (P) of Ni/Al nanomultilayers deposited by magnetron sputtering as a function of the periodic number (n),Ni/Al modulated ratio (R) and modulated period (L) have been characterized by Fuchs-Sondheimer (FS)-Mayadas-Shatzkes (MS) model.The results show that theρvalue is independent of n.With decreasing of R and L,the increases and theρvalue decreases. The observed scale dependence of theρvalue reflects the size effect in the interface diffusion of metal nanomultilayers.Due to the nonsymmetrical interdiffusion behavior,the mutual promotion effect in the interfaces only displays at the lower R and smaller L.Once the length scale is upon a critical value, this effect turns to be weakened and the interracial diffusion becomes invisible.
【Key words】 Ni/Al; nanomultilayer; resistivity; modulated structure; interface diffusion;
- 【文献出处】 金属学报 ,Acta Metallurgica Sinica , 编辑部邮箱 ,2008年03期
- 【分类号】TB383.1
- 【被引频次】7
- 【下载频次】364