【摘要】 利用真空阴极多弧离子镀系统在Cr12Mo4V钢基材上制备出膜基间结合很好的纳米超硬氮化钛(TiN)薄膜。利用纳米硬度计、划痕仪、球-盘试验机、X射线衍射仪、透射电子显微镜和扫描电子显微镜分别考察了薄膜的纳米硬度、膜基间结合力、摩擦磨损性能和显微结构。结果表明,气体压力和脉冲基体负偏压对薄膜性能有重要影响;超硬TiN薄膜的纳米硬度为47.6 GPa、临界载荷为63 N、摩擦因数在0.5至0.8之间;结构细密的超硬薄膜在(111)晶面有强烈的择优取向。更多还原

【Abstract】 A well-adherent nano-superhard titanium nitride(TiN)film was deposited on substrates of Cr12Mo4V steel by a vacuum cathode multi-arc ion-plated system.Nanohardness,film-to-substrate adhesion,tribological property and microstructure of a nano-superhard TiN film were investigated respectively using nanoindentor,scratch tester,ball-on-disc tester,X-ray diffractometer,transmission electron microscope and scanning electron microscope.The results show that the gas pressure and the pulsed substrate bias voltage have an important influence on the film properties.The average nanohardness of the film is 47.6GPa,critical load(Lc)between the film and the substrate is 63 N,and its frictional coefficient ranging between 0.5-0.8 and the nano-superhard film contains a fine and dense structure with a strong preferential orientation on crystallographic plane(111).更多还原