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织构诱发异常晶粒长大的Monte Carlo模拟
Modeling abnormal grain growth induced by texture using Monte Carlo method
【摘要】 利用欧拉角表示晶粒取向的Monte Carlo方法,模拟了异常晶粒长大过程。通过Voronoi模型产生了晶粒尺寸近似符合Lognormal分布且具有立方织构的初始组织,比较了该组织中不同织构半峰宽和体积分数对晶粒长大过程的影响。模拟结果表明:随着半峰宽变大,异常晶粒长大可能性和平均晶粒尺寸都变大;织构体积分数对异常晶粒长大的影响相对较小,只在半峰宽较小且体积分数很大时,才抑制异常晶粒长大,模拟结果与实验吻合。另外,模拟组织中平均晶粒长大速度不仅受到晶界迁移率的影响,而且受到异常晶粒长大数量的影响。
【Abstract】 Abnormal grain growth was simulated using a Monte Carlo method in which the grain orientation is expressed by Euler angle.An initial microstructure,in which the distribution of grain size is close to lognormal function and the cube textures exist was generated by Voronoi model to evaluate the effects of the half-width and the fractions of texture on grain growth.The results show that the possibility of abnormal growth and the average grain size increase as the half-width increases,but the influence of the volume fraction is relatively small,and if the half-width is smaller and the volume fraction of texture is larger,the abnormal grain growth is inhibited.The simulated results are in correspondence with the experimental ones.In addition,the average grain size is affected not only by the grain boundary migration,but also by the number of abnormal growth grain.
【Key words】 texture; abnormal grain growth; Monte Carlo method; simulation; half-width;
- 【文献出处】 材料热处理学报 ,Transactions of Materials and Heat Treatment , 编辑部邮箱 ,2008年06期
- 【分类号】TG111.7
- 【被引频次】13
- 【下载频次】320