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ZnS上金刚石膜的过渡层设计和附着力研究

Interlays design and its adhesion between ZnS and diamond protective coating

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【作者】 郝鹏张树玉黎建明杨海苏小平余怀之刘伟贺琪

【Author】 HAO Peng1,ZHANG Shu-yu1,LI Jian-ming1,YANG Hai1,SU Xiao-ping1,YU Huai-zhi1,LIU Wei1,HE Qi2(1.General Research Institute for Nonferrous Metals,Beijing 100088,China;2.School of Material Science and Engineering,University of Science and Technology Beijing,Beijing 100083,China)

【机构】 北京有色金属研究总院北京科技大学材料科学与工程学院 北京100088北京100088北京100083

【摘要】 CVD ZnS是中长波前视红外窗口和整流罩的合适材料,文中从折射率、热应力、透射波段和附着力等方面考虑,由实验设计出HfO2/非晶膜双层结构作为ZnS与金刚石保护膜间的过渡层,采用射频反应磁控溅射技术在ZnS表面制备过渡膜层,并采用划痕法研究了薄膜的显微结构对其与衬底间附着力的影响。结果表明,金刚石能够在HfO2/非晶膜过渡层上形核、生长,得到优质的保护膜,同时过渡层也缓解了金刚石膜与ZnS衬底间由于热膨胀系数的较大差异而引起的膜层脱落问题,单面沉积过渡层的ZnS在2~12μm范围具有增透膜的作用。与AlN/非晶膜组成的过渡层相比,HfO2/非晶膜组成的过渡层具有更小的残余应力。在典型实验条件下,该过渡层与ZnS衬底附着性良好,研究发现薄膜的显微结构对附着力的大小有重要影响,形成细小致密的柱状纤维结构,有利于提高附着力。

【Abstract】 The most successful and widely used material for high speed forward looking IR window and dome is chemical vapour deposited(CVD) ZnS.Taking refractive index,thermal stress,transmission spectrum and adhesion into account,the stack interlayers of HfO2/amorphous films between ZnS and diamond protective coating were designed.The interlayers were deposited on ZnS substrate by RF reactive magnetron sputtering.Effect of film microstructure on adhesion between interlayer and substrate was investigated.Results reveal that the stack interlayers of HfO2/amorphous films provides good surface for diamond nucleation and growth,and releases the thermal expansion mismatch between ZnS and diamond coating.In addition,ZnS substrate with the stack interlayers has good transmission at 2 ̄12 μm.To some extent,the interlayers acts as anti "reflecting coating.Compared with the stack interlayers of AlN/ amorphous film,the stack interlayers of HfO2/amorphous film acquires reduced residual stress.The typical interlayers with compact columnar microstructure shows good adhesive ability on ZnS.

【关键词】 过渡层ZnS金刚石膜附着力
【Key words】 InterlayersZnSDiamond coatingAdhesion
【基金】 国防科工委“十一五”资助项目
  • 【文献出处】 红外与激光工程 ,Infrared and Laser Engineering , 编辑部邮箱 ,2008年02期
  • 【分类号】O484
  • 【被引频次】9
  • 【下载频次】244
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