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抛光参量对抛光光学元件亚表层的影响
Influences of Polishing Parameters on Subsurface Damage of Polishing Components
【摘要】 研究了抛光粉的种类、抛光速度的大小以及抛光玻璃的性质等抛光参量对光学元件亚表层特征的影响,并结合抛光机理进行了分析。
【Abstract】 The influence of the parameters during the polishing process such as the types of polishing powder, the polishing speed, the characters of the polishing glass, on the properties of the polished components has been studied, and the detailed analysis has been made based on the polishing theory.
【关键词】 抛光;
亚表层缺陷;
抛光粉;
熔石英;
抛光速度;
【Key words】 polishing; subsurface damage; polishing powder; fused silica; polishing speed;
【Key words】 polishing; subsurface damage; polishing powder; fused silica; polishing speed;
- 【文献出处】 航空精密制造技术 ,Aviation Precision Manufacturing Technology , 编辑部邮箱 ,2008年01期
- 【分类号】TG580.692
- 【被引频次】3
- 【下载频次】252