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复合离子镀膜技术制备Cr+Ti+TiNC/TiNC+C/DLC膜性能研究
Properties of Cr+Ti+TiNC/TiNC+C/DLC films prepared by composite ion plating
【摘要】 结合中频孪生靶非平衡磁控溅射、电弧离子镀和霍尔离子源辅助沉积三种工艺,制备了Cr+Ti+TiNC/TiNC+C/DLC硬质膜。硬质膜呈深黑色,表面比较光滑,顶层为掺N的类金刚石(Diamond-like Carbon,DLC)膜,中间层为含C的TiNC,底层为含Ti和Cr的TiNC,力学性能良好。
【Abstract】 Cr+Ti+TiNC/TiNC+C/DLC films were prepared by combining unbalanced magnetron sputtering with cathode arc and Hall ion source. The films, with smooth surface, are deep black in color. In order to improve adhesive property of the DLC films to the substrate, graded interlayers, Cr+Ti+TiNC and TiNC+C have been used. The multi- layer film shows good mechanics properties.
【关键词】 类金刚石膜;
多层膜;
非平衡磁控溅射;
电弧离子镀;
X射线光电子能谱仪;
【Key words】 Diamond-like carbon film; Multilayer films; Unbalanced magnetron sputtering; Cathode arc; X-ray Photoelectron Spectroscopy;
【Key words】 Diamond-like carbon film; Multilayer films; Unbalanced magnetron sputtering; Cathode arc; X-ray Photoelectron Spectroscopy;
【基金】 深圳市科技计划项目资金(SY200609080027A)资助
- 【文献出处】 核技术 ,Nuclear Techniques , 编辑部邮箱 ,2008年02期
- 【分类号】O484.4;TB43
- 【被引频次】6
- 【下载频次】355