【摘要】 采用射频溅射法在SnO₂衬底上生长了NiO_x薄膜,制备的薄膜是非理想化学计量的微晶薄膜。研究了氧分压对NiO_x薄膜的溅射速率、表面形貌和光学电学特性的影响。研究结果显示,O₂分压在1:10时,可得到最快的沉积速率;低的氧分压沉积的薄膜表面比较疏松;随着氧含量的增加,方块电阻呈上升趋势,当氧分压达到一定值时,膜电阻又开始下降;随着氧分压的升高,颜色会逐渐加深,透射率降低。更多还原

【Abstract】 The NiO_x thin films were deposited on SnO₂/glass substrates by RF sputtering,the films are non-stoi- choimetric and mierocrystal.The deposition rate,surface morphology,electrical and optical properties of NiO_x films have been investigated.The results show the highest deposition rate is found when the oxygen partial pressure is at 1:10;the films have loose structure at lower oxygen partial pressure;the sheet resistance increa- ses as the oxygen content is more;the sheet resistance decreases at a certain oxygen content;the films become darker and optical transmittance decreases as the oxygen partial pressure increases.更多还原