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脉冲激光沉积Bi_0.5(Na_0.7K_0.1Li_0.2)_0.5TiO₃无铅压电薄膜的研究

Study of Bi_0.5(Na_0.7K_0.1Li_0.2)_0.5TiO₃ film by pulse laser deposition

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【Author】 LU Lei1,2,XIAO Ding-quan1,LIN Dun-min1,3,ZHANG Yong-bin2,ZHU Jian-guo1 (1.School of Material Science and Engineering,Sichuan University,Chengdu 610064,China; 2.State Key Laboratory for Surface Physics and Chemistry,Mianyang 621907,China; 3.Department of Applied Physics,The Hong Kong Polytechnic University,Hongkong,China)

【机构】四川大学材料科学与工程学院；表面物理与化学国家重点实验室；四川大学材料科学与工程学院四川成都610064；四川绵阳621907；四川成都610064；香港理工大学应用物理系；香港九龙；

【摘要】采用脉冲激光沉积制备了新型无铅压电Bi0.5(Na0.7K0.1Li0.2)0.5TiO3陶瓷薄膜,分别利用X射线衍射仪、X射线光电子谱、俄歇电子能谱、原子力显微镜及扫描电镜研究了该薄膜的晶体结构、组成成分及表面形貌。结果表明,薄膜基体温度和工作气压对所生长的薄膜影响较大;在SiO2/Si基片上制备Bi0.5(Na0.7K0.1Li0.2)0.5TiO3薄膜的最佳温度和氧气压力分别为600℃和13Pa;利用脉冲激光沉积的薄膜具有精细的表面结构。更多还原

【Abstract】 A new type lead-free piezoelectric ceramic film of Bi0.5(Na0.7K0.1Li0.2)0.5TiO3 has been made by pulsed laser deposition.The crystal structure,component and surface pattern of Bi0.5(Na0.7K0.1Li0.2)0.5TiO3 have been studied with X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS),Auger energy spectroscopy(AES),atomic force microscopy(AFM),scanning electron microscopy(SEM) and.The results showed the properties of Bi0.5(Na0.7K0.1Li0.2)0.5TiO3 films are strongly influenced by substrate temperature and oxygen pressure.The substrate temperature 600 ℃ and oxygen pressure 13Pa are found to be optimized parameters for the growth of textured film.The Bi0.5(Na0.7K0.1Li0.2)0.5TiO3 films are fine,uniform and dense.更多还原