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Ni-P底层对化学镀Co-P薄膜性能的影响

The influence of Ni-P underlayer on electroless Co-P thin film properties

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【作者】 王海成杜中美王立锦滕蛟李明华于广华

【Author】 WANG Hai-cheng,DU Zhong-mei,WANG Li-jin,TENG Jiao,LI Ming-hua,YU Guang-hua(Materials Science and Engineering School,University of Science and Technology Beijing,Beijing 100083,China)

【机构】 北京科技大学材料科学与工程学院北京科技大学材料科学与工程学院 北京100083北京100083

【摘要】 采用化学镀工艺制备了Co-P磁记录薄膜,研究了非晶无磁Ni-P底层对Co-P薄膜的生长及性能的影响。研究结果表明:非晶无磁Ni-P底层对Co-P薄膜的晶体结构及取向无明显影响,镀态的Co-P薄膜均为密排六方结构,(100)(、002)、(101)的择优取向无明显变化;但非晶无磁的Ni-P底层可以提高薄膜的均匀性和一致性,表面无明显缺陷;细化晶粒,平均晶粒尺寸为100~150nm;提高Co-P薄膜的磁性能,矫顽力可达4.54×104A/m。当记录信号脉冲时,与铝基体上直接施镀相比,在Ni-P底层上的Co-P磁记录薄膜输出信号幅值均匀稳定,信噪比良好。

【Abstract】 Magnetic recording Co-P thin films were prepared by electroless deposition.The influence of amorphous nonmagnetic Ni-P underlayer on Co-P thin film growth and properties was studied.The results indicated that,the amorphous nonmagnetic Ni-P underlayer didn’t have an obvious effect on the structure and texture of the Co-P thin f lms.However,it can improve the uniformity,consistency and magnetic properties of the Co-P thin films,and refine the grains.When recorded pulse signals,the Co-P magnetic recording thin films with Ni-P underlayer have a uniform and steady output and good signal to noise ratio compared with that deposited directly on aluminium substrates.

【基金】 国家自然科学基金资助项目(50471093)
  • 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2008年01期
  • 【分类号】O484.4
  • 【被引频次】3
  • 【下载频次】187
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