【摘要】 综述了化学气相沉积(Chemical Vapor Deposition,简称CVD)技术制备高温抗氧化涂层—铂族金属(Pt、Ir)涂层及难熔金属(W、Mo、Ta、Nb、Re)的方法。并对部分有报道的沉积参数以及沉积参数对沉积层结构及性质的影响进行了介绍。更多还原

【Abstract】 An introduction has been given to the methods and procedures of chemical vapor deposition(CVD) of platinum group metals(Pt,Ir) coatings,which are used as the high temperature oxidation resistant coatings,and refractory metals(W,Mo,Ta,Nb,Re).Some reported technical parameters and their effects on the deposition were also introduced.更多还原