【摘要】 研究铜、铝作为银薄膜的缓冲层对银薄膜的光电学性质的影响.利用热蒸发技术在BK-7玻璃基底上沉积Ag(220 nm)/Al(20 nm)和Ag(220 nm)/Cu(20 nm)薄膜,沉积薄膜在温度为400、500℃的大气条件下退火处理1 h.样品的表面形貌用原子力显微镜观测,光学和电学性质分别用分光光度计和vander Pauw方法测量.实验结果表明,相对于同等条件下制备的纯银薄膜,附加缓冲层大大提高了退火态薄膜的光电性质,改善了银薄膜的热稳定性.不同的缓冲层对银薄膜光电性质影响程度不同:在同一退火温度下,在可见光谱区域,Ag/Al薄膜的反射率大于Ag/Cu薄膜;Ag/Cu薄膜的电阻率ρ小于Ag/Al薄膜,且在退火温度为500℃时Ag/Cu薄膜的ρ最小.更多还原

【Abstract】 The effect of different intermediate layers on electrical and optical properties of silver films has been studied.Ag(220 nm) /Al(20 nm) and Ag(220 nm)/Cu(20 nm) films were prepared on BK-7 glass substrates by thermal evaporation technique,and subsequently annealed in air for 1h at temperatures of 400 and 500 ℃.The surface morphology,reflectance and resistivity of the as-deposited and annealed samples were investigated by atomic force microscopy,spectrophotometer and van der Pauw method,respectively.Comparing with the pure silver films, the annealed Ag/Al and Ag/Cu films improve significantly the thermal stability of the electrical and optical properties.Moreover,the different intermediate layers will give different electrical and optical properties of the films.It is found that the reflectance of the annealed Ag/Al is better than that of the annealed Ag/Cu film,and the resistivity of annealed Ag/Cu thin films is lower than that of annealed Ag/Al film.更多还原