【摘要】 高纯Al溅射靶材在电子信息产品制造业有着广泛应用。微观结构与组织的均匀性、晶粒尺寸和取向分布对高纯Al溅射靶材的性能有很大的影响。本文采用EBSD技术对高纯Al溅射靶材的晶粒取向分布进行了分析,探索了晶粒取向与溅射速率关系,并采用EBSD大面积扫描对高纯Al溅射靶材的晶粒尺寸及微观结构与组织均匀性进行了研究。更多还原

【Abstract】 High purity aluminum sputtering targets are widely used in electronic message industry.The function of high purity aluminum sputtering targets is seriously affected by the homogeneity of microstructure,grain size and orientation distribution of grains.In this paper,the orientation and size distributions of high purity aluminum sputtering targets grains were analyzed by EBSD method,the relationship between the orientation distribution of grains and the sputtering velocity of targets was discussed.更多还原