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Surface Modification of Nanometre Silicon Carbide Powder with Polystyrene by Inductively Coupled Plasma

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【作者】 韦刚孟月东钟少锋刘峰蒋仲庆舒兴胜任兆杏王祥科

【Author】 WEI Gang~(1,2) MENG Yuedong~1 ZHONG Shaofeng~3 LIU Feng~1 JIANG Zhongqing~1 SHU Xingsheng~1 REN Zhaoxing~1 WANG Xiangke~11 Institute of Plasma Physics,Chinese Academy of Sciences,Hefei 230031,China2 Beijing North Microelectronics Co.,Ltd,Beijing 100016,China3 Academy of Opto-Electronies,Chinese Academy of Sciences,Beijing 100010,China

【机构】 Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China Beijing North Microelectronics Co., Ltd, Beijing 100016, ChinaInstitute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, ChinaAcademy of Opto-Electronics, Chinese Academy of Sciences, Beijing 100010, China

【摘要】 <正> An investigation was made into polystyrene (PS) grafted onto nanometre sili-con carbide (SiC) particles.In our experiment,the grafting polymerization reaction was in-duced by a radio frequency (RF) inductively coupled plasma (ICP) treatment of the nanome-tre powder.FTIR (Fourier transform infrared spectrum) and XPS (X-ray photoelectron spec-troscopy) results reveal that PS is grafted onto the surface of silicon carbide powder.An analysisis presented on the effectiveness of this approach as a function of plasma operating variablesincluding the plasma treating power,treating time,and grafting reaction temperature and time.

【Abstract】 An investigation was made into polystyrene (PS) grafted onto nanometre sili- con carbide (SiC) particles.In our experiment,the grafting polymerization reaction was in- duced by a radio frequency (RF) inductively coupled plasma (ICP) treatment of the nanome- tre powder.FTIR (Fourier transform infrared spectrum) and XPS (X-ray photoelectron spec- troscopy) results reveal that PS is grafted onto the surface of silicon carbide powder.An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power,treating time,and grafting reaction temperature and time.

  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2008年01期
  • 【分类号】O539
  • 【被引频次】2
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