【摘要】 基于扫描电镜(SEM)的纳米级电子束曝光系统能够以较低成本满足科研单位对纳米加工设备的需求。在电子束曝光系统中,需要快速束闸控制电子束通断以实现纳米图像的多场曝光。从安装位置、机械结构和驱动器等方面讨论快速束闸的设计。更多还原

【Abstract】 Nanometer E-beam lithography based on SEM can meet the need of nanofabrication research and design activities at low price. Fast beam blanker is needed when a nano-pattern with more one writing field in E-beam lithography. This paper presented the design of fast beam blanker from the placing position, structure and its driver with examples.更多还原