节点文献
浸没式阵列激光扫描直写光刻
Laser Array Direct Scanning Photolithography with Immersion Lens
【摘要】 介绍一种以显微镜结构为基础的浸没式阵列激光扫描直写光刻系统的光路结构、有效焦深、自动调焦及曝光能量控制的原理和方法。实验系统的有效数值孔径(ENA)为1.83,使用的激光波长为355nm时,在实验室条件下得到的最细线条宽度为65nm。
【Abstract】 The principles and methods of the optical system, efficiency focus depth, auto focusing, exposure energy control of a laser array direct scanning microlithography system with immersion lens are described in this paper. The efficiency numerical aperture is 1.83. The minimal line width is 65nm with 355nm laser beam scanning photolithography in laboratory.
【关键词】 阵列激光扫描;
浸没式镜头;
直写光刻;
【Key words】 Array laser scanning; Immersion lens; Direct Photolithography;
【Key words】 Array laser scanning; Immersion lens; Direct Photolithography;
- 【文献出处】 电子工业专用设备 ,Equipment for Electronic Products Manufacturing , 编辑部邮箱 ,2008年10期
- 【分类号】TN405;TN249
- 【被引频次】4
- 【下载频次】135