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大口径光学反射镜化学镀镍工艺及质量管理

Process and quality management of electroless nickel-phosphorus alloy plating on large-aperture optical reflection mirror

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【作者】 姜伟申德新王立波李刚赵汝成

【Author】 JIANG Wei, SHEN De-xin, WANG Li-bo, LI Gang, ZHAO Ru-cheng Changchun UP Optotech Co., Ltd., Changchun 130031, China

【机构】 中国科学院长春光学精密机械与物理研究所中国科学院研究生院

【摘要】 根据光学系统中铝合金、铍合金和无氧高导铜材料反射镜对镍–磷合金镀层的质量要求,在含30g/LNiSO4·6H2O、10g/LNaH2PO2·H2O、10g/LCH3COONa、20g/LC6H5Na3O7·2H2O、10~20g/L稳定剂的体系中,于82~90°C、pH=4.4~4.8、装载量0.3~10.0dm2/L的条件下,以5μm/h的沉积速度在大口径反射镜表面沉积出无缺陷、结合力良好的优质镀层,镀层厚度为100μm。分析了应用于反射镜的化学镀镍–磷合金工艺的特点,讨论了以提高镀层结合力、避免镀层表面缺陷为目的的化学镀镍–磷合金工艺及其质量控制方法,总结了生产过程实施监控时应注意的事项。

【Abstract】 According to the quality requirement for electroless Ni–P alloy plating on a large-aperture optical mirror made of Al alloy, Be alloy and OFHC (oxygen-free high conductivity) Cu, an excellent defect-free coating with a thickness of 100 μm and good adhesion was obtained at a deposition rate of 5 μm/h from a bath containing 30 g/L NiSO4·6H2O, 10 g/L NaH2PO2·H2O, 10 g/L CH3COONa, 20 g/L C6H5Na3O7·2H2O and 10-20 g/L stabilizer at temperature 82-90 °C, pH 4.4-4.8 and loading rate of 0.3-10.0 dm2/L. The characteristics of electroless Ni–P alloy plating on optical mirror were analyzed. The process and quality control method for improving adhesion and avoiding surface defects were discussed. Some points worthy of attention during monitoring in production were summarized.

【基金】 中科院三期创新基金(07Y32W070)
  • 【文献出处】 电镀与涂饰 ,Electroplating & Finishing , 编辑部邮箱 ,2008年10期
  • 【分类号】TQ153.12
  • 【被引频次】5
  • 【下载频次】184
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