【摘要】 用交替射频磁控溅射法在石英基片上沉积并退火制备了ZrW₂O₈薄膜,测量了薄膜与基片之间的结合力和薄膜厚度,研究了薄膜的负热膨胀特性.结果表明:用磁控溅射方法制备的薄膜为非晶态,表面平滑、呈颗粒状,在1200℃热处理3 min后得到立方相ZrW₂O₈薄膜,结晶薄膜的颗粒长大,薄膜与基片之间有良好的结合力.立方相ZrW₂O₈薄膜在15-200℃热膨胀系数为-24.81×10^-6K^-1,200-700℃热膨胀系数为-4.78×10^-6K^-1,平均热膨胀系数为-10.08×10^-6K^-1.更多还原

【Abstract】 ZrW₂O₈ thin films were deposited on quartz substrates by alternating RF magnetron sputtering with WO₃ and ZrO₂ ceramic target and followed by annealing at different temperatures.The phase composition,morphology,thickness and cohesion of the ZrW₂O₈ thin films were measured,and the negative thermal expansion properties were investigated.The results showed that the as-deposited ZrW₂O₈ film shows an amorphous phase and its surface is smooth and granular.The cubic ZrW₂O₈ thin film can be prepared at 1200℃for 3 min in air and the grain size of the film grows bigger.The cohesion between the quartz substrate and the ZrW₂O₈ thin film is fine.The thermal expansion coefficient of ZrW₂O₈ film is -24.81×10^-6K^-1 in the temperature range from 15℃to 200℃,and -4.78×10^-6K^-1 from 200℃to 700℃,and the average value of the coefficient is -10.08×10^-6K^-1 in the temperature range from 15℃to 700℃.更多还原