【摘要】 采用脉冲激光沉积(PLD)技术,在不同环境压强下于室温Si衬底上沉积制备出了Ge纳米薄膜。用X射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了环境压强对薄膜的微观结构、形貌以及膜厚的影响规律。结果表明:所制备的纳米薄膜中Ge均为晶态;随着环境压强的增大,薄膜表面由常规的量子点镶嵌结构演变为类网状结构;膜厚随着环境压强的增大而减小。更多还原

【Abstract】 Using a pulse laser deposition technology,the Ge nanofilms are prepared on Si substrate in various ambient pressures of Ar gas.The effect of microstructures morphology and film thickness of the nanofilms is studied by a X-ray diffraction and a scanning electron microscope,respectively.Such Ge nanofilms obtained are all crystallized in the experiment.Further,the observed surface configuration of the films is evolved from the embedded quantum dots as usual to the net-like assembled nanoparticles with the increase of the ambient pressure,while the film thickness is reduced in our experiment.更多还原