【摘要】 高能氩离子束溅射金属铝靶,沉积在单晶Si基片上的非晶薄膜是Al和Al₂O₃的混合物。在空气中对其进行900～1200℃的热处理,成功地制备了以不同结晶形式存在的多晶Al₂O₃薄膜,讨论了不同退火温度对其结晶性能、表面形貌及红外吸收光谱的影响,为Al₂O₃薄膜制备与应用提供了良好借鉴。更多还原

【Abstract】 After high energy Ar⁺ ion beam sputters aluminum target,the amorphous thin flims are deposited on Si substrates,which are a mixture of Al and Al₂O₃.Annealing at 900¹200℃in the air,the thin films with different crystalline forms are successfully prepared.The influence of annealing temperature on the crystallization,surface morphology and infrared absorption spectra of Al₂O₃ thin film is discussed.The above analysis offers some references for the preparation and application of Al₂O₃ thin films.更多还原