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Gilch法合成聚对苯乙炔缺陷及分子量的控制

Control of Defects and Molecular Weight of Ploy(p-phenylenevinylene) Prepared by Gilch Method

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【作者】 闫裔超唐先忠王姣黄嘉

【Author】 YAN Yichao TANG Xianzhong WANG Jiao HUANG Jia(State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 610054)

【机构】 电子科技大学电子薄膜与集成器件国家重点实验室

【摘要】 聚对苯乙炔及其衍生物由于具有独特的导电性和荧光特性,目前广泛应用于有机光致器件、激光器件以及光探测器等领域。Gilch法合成聚对苯乙炔材料中往往存在缺陷,这些缺陷对材料及器件的光电性能产生影响。综述了控制PPV凝胶及苄基-二苯乙炔缺陷的方法,介绍了PPV分子量的影响因素。

【Abstract】 Poly(p-phenylenevinylene) and its derivatives are widely used in the organic light-emitting diodes,la- ser devices and photodetectors.The different defects in the ploy(p-phenylenevinylene) prepared by the Gilch method have a great influence on the photoelectric properties of materials and devices.In this paper the method that control the amount of gel and tolane -bisbenzyl is introduced.The molecular weight of the ploy(p-phenylenevinylene) has a influ- ence on the wavelength,so in this paper the factors which influence the molecular weight of ploy(p-phenylenevinylene) are also discussed.

【基金】 国家自然科学基金(60771044)
  • 【分类号】TB34
  • 【下载频次】117
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