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Gilch法合成聚对苯乙炔缺陷及分子量的控制
Control of Defects and Molecular Weight of Ploy(p-phenylenevinylene) Prepared by Gilch Method
【摘要】 聚对苯乙炔及其衍生物由于具有独特的导电性和荧光特性,目前广泛应用于有机光致器件、激光器件以及光探测器等领域。Gilch法合成聚对苯乙炔材料中往往存在缺陷,这些缺陷对材料及器件的光电性能产生影响。综述了控制PPV凝胶及苄基-二苯乙炔缺陷的方法,介绍了PPV分子量的影响因素。
【Abstract】 Poly(p-phenylenevinylene) and its derivatives are widely used in the organic light-emitting diodes,la- ser devices and photodetectors.The different defects in the ploy(p-phenylenevinylene) prepared by the Gilch method have a great influence on the photoelectric properties of materials and devices.In this paper the method that control the amount of gel and tolane -bisbenzyl is introduced.The molecular weight of the ploy(p-phenylenevinylene) has a influ- ence on the wavelength,so in this paper the factors which influence the molecular weight of ploy(p-phenylenevinylene) are also discussed.
【Key words】 ploy(p-phenylenevinylene); gel; tolane-bisbenzyl; molecular weight;
- 【文献出处】 材料导报 ,Materials Review , 编辑部邮箱 ,2008年06期
- 【分类号】TB34
- 【下载频次】117