【摘要】 利用高速热铁盘抛光设备对化学气相沉积(CVD,Chemical Vapor Deposi-tion)金刚石进行抛光,分别进行温度、转速、压力以及抛光时间的实验.采用光学天平对抛光前后金刚石称重对比,采用工具显微镜和原子力显微镜对抛光后表面进行研究.结果表明:较高的抛光速度对提高表面质量以及抛光效率均比较有利.在抛光温度850℃,速度164 mm/s,压力24.892 N的条件下,抛光120 min后,金刚石表面的粗糙度由原来的Ra=9.67μm下降到Ra=0.016μm.原子力显微镜显示,抛光表面存在少数高度在60~70 nm之间的突峰,其高度是普通峰高的2~3倍,且峰的形状呈现出一定的方向性.这种表面微观规律与抛光时采用的直压式运动方式有关.更多还原

【Abstract】 By using high speed polishing equipment based on hot metal plate method(HMPM),experiments were carried out on temperature,speed,load and time to polish CVD(chemical vapor deposition) diamonds.Optical balance was used to compare the diamond weight before and after polishing.Tool microscope and atomic force microscope(AFM) were adopted to research the polished surface.The research shows that high polishing speed is helpful to the surface quality and polishing rate.Under the following conditions: temperature 850 ℃,polishing speed 164 mm/s,load 24.892 N,polishing time 120 minutes,the degree of roughness on the diamond can reach to Ra 0.016 μm compared to the original roughness of Ra 9.67 μm.Surface topography taken by AFM shows that there are only a small amount of summits which are 60~70 nm in height and the shapes of summits are in special character.The height of high summits is 2 to 3 times than that of ordinary summits.The special topography should be related with the direct pressure polishing method.更多还原