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MOCVD生长的GaN薄膜中缺陷团引起的X射线漫散射研究(英文)

Defect Cluster-Induced X-Ray Diffuse Scattering in GaN Films Grown by MOCVD

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【作者】 马志芳王玉田江德生赵德刚张书明朱建军刘宗顺孙宝娟段瑞飞杨辉梁骏吾

【Author】 Ma Zhifang1,Wang Yutian1,Jiang Desheng1,Zhao Degang1,Zhang Shuming1,Zhu Jianjun1,Liu Zongshun1,Sun Baojuan2,Duan Ruifei2 ,Yang Hui1,3,,and Liang Junwu1(1 State Key Laboratory on Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China)(2 Research and Development Center for Semiconductor Lighting,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China)(3 Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences,Suzhou 215123,China)

【机构】 中国科学院半导体研究所集成光电子国家重点实验室中国科学院半导体所半导体照明研发中心中国科学院半导体研究所集成光电子国家重点实验室 北京100083北京100083中国科学院苏州纳米技术及纳米仿生研究所苏州215123

【摘要】 采用高分辨X射线衍射对在蓝宝石(0001)面生长的GaN外延膜的漫散射进行了研究.结果表明,GaN薄膜中存在缺陷团,其浓度随着穿透位错密度的增加而增加,其平均半径呈相反趋势.基于位错是点缺陷的聚集区,缺陷团优先在位错附近形成的效应对结果进行了解释.同时发现电子迁移率随缺陷团浓度的增加而减少.

【Abstract】 High-resolution X-ray diffraction has been employed to investigate the diffuse scattering in a (0001) oriented GaN epitaxial film grown on sapphire substrate.The analysis reveals that defect clusters are present in GaN films and their concentration increases as the density of threading dislocations increases.Meanwhile,the mean radius of these defect clusters shows a reverse tendency.This result is explained by the effect of clusters preferentially forming around dislocations,which act as effective sinks for the segregation of point defects.The electric mobility is found to decrease as the cluster concentration increases.

【关键词】 X射线漫散射GaN缺陷团
【Key words】 X-ray diffuse scatteringGaNdefect cluster
【基金】 国家自然科学基金(批准号:60506001,60476021,60576003);国家重点基础研究发展规划(批准号:2007CB936700)资助项目~~
  • 【文献出处】 半导体学报 ,Journal of Semiconductors , 编辑部邮箱 ,2008年07期
  • 【分类号】TN304
  • 【被引频次】1
  • 【下载频次】167
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