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Cu基体电镀Ni层表面渗Al组织及其形成机理

Aluminizing microstructure and its formation mechanism on electro-deposited nickel layer on copper matrix

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【作者】 王红星盛晓波储成林林萍华董寅生

【Author】 WANG Hong-xing1,SHENG Xiao-bo1,CHU Cheng-lin1,LIN Ping-hua1,2,DONG Yin-sheng1(1.School of Materials Science and Engineering,Southeast University,Nanjing 211189,China;2.School of Materials Science and Engineering,Hohai University,Nanjing 210098,China)

【机构】 东南大学材料科学与工程学院东南大学材料科学与工程学院 南京211189南京211189河海大学材料科学与工程学院南京210098

【摘要】 以纯Al粉为渗剂、NHCl4作为活化剂、鸡蛋清为粘结剂、Cu基体镀Ni层表面渗Al。研究经800℃保温12 h后的渗铝层的表面形貌、组织、厚度和截面元素分布,分析渗铝过程的机理。结果表明:渗铝处理后Cu-Ni界面结合良好。渗铝层组织为单一的富Al的Ni2Al3金属间化合物。渗铝层厚度为200μm,平均显微硬度HV达到1 100。Al的沉积和运输主要依靠AlCl2完成。

【Abstract】 The surface of the electro-deposited nickel layer on copper matrix was aluminized by a slurry pack cementation process.Using aluminum powders as doner,NH4Cl as the activator and albumen(egg white) as the cohesive agent.The surface morphology,the thickness,the phases and the elements distribution in the cross-section of aluminized layer fabricated at 800 ℃ for 12 h were studied,and the aluminizing mechanism was discussed.The results show that the interface of the Cu/Ni is bound excellently after aluminization.The microstructure of the aluminized layer is a single-phase Ni-rich Ni2Al3 intermetallic compound.The thickness of aluminized coating was 200 μm.The average micro hardness of the aluminized layer is HV 1 100.AlCl2 is responsible for the transportation and deposition of Al in the slurry pack.

  • 【文献出处】 中国有色金属学报 ,The Chinese Journal of Nonferrous Metals , 编辑部邮箱 ,2007年10期
  • 【分类号】TG174.445
  • 【被引频次】21
  • 【下载频次】282
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