【摘要】 采用电子背散射衍射技术(EBSD)测定了化学气相沉积纯钨(CVD-W)的晶粒取向和晶界分布特征,研究化学气相沉积方法制备纯钨的组织和晶界结构的特点。测试结果表明:CVD-W生长组织具有三个生长区,分别是等轴晶区、混合生长晶区和柱状晶区;柱状晶区的晶粒具有显著的〈001〉择优生长;低∑CSL晶界占据较大比例,其中以∑3、∑5为主要结构,∑3的出现频率最大。研究认为CVD-W的晶粒取向和晶界结构特点与沉积组织的生长特点密切相关。更多还原

【Abstract】 The EBSD technology was used for determining the grain orientation and the structure of grain boundary,in order to obtain their characteristics of CVD-W.The test result shows that there are three growing zones in micro-structure of CVD-W: region of equiaxed grain,region of mixed grain and region of columnar grain.In region of columnar grain,preferred orientation growth is obvious.Obviously preferred orientation on 〈001〉 was confirmed by the anti-pole figure.Besides,the CSL grain boundary such as ∑3,∑5 and so on are observed.Among these kinds of boundaries,the ∑3 boundary has the highest frequency.The characteristics of grain orientation and the structure of grain boundary of CVD-W should be related to the structure growning characteristics.更多还原