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金属基体上硬质薄膜内应力的释放测量法
Measurement of Internal Stresses in Hard Films Grown on Metal Substrate
【摘要】 提出了一种基于Stoney公式测量金属基体上硬质薄膜内应力的应力释放法,并研究了不同基底温度对磁控溅射TiN薄膜内应力的影响。
【Abstract】 In this paper,a new way of measurement based on Stoney Equation was proposed,in which the internal stresses in the hard thin films deposited on metal substrate could be measured.And the effect of the substrate’s temperature on internal stresses in magnetron sputtering TiN thin films was evaluated.
【基金】 国家自然科学基金项目(No.50571062)
- 【文献出处】 真空科学与技术学报 ,Chinese Journal of Vacuum Science and Technology , 编辑部邮箱 ,2007年06期
- 【分类号】O484.5
- 【被引频次】1
- 【下载频次】224